发明名称 TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a treatment system which can restrain that a clean room is enlarged, while productivity is improved. SOLUTION: A vacuum system treatment area 50 applying treatment of vacuum system to a glass board G and an atmosphere system treatment area 70 applying treatment of atmosphere system to the glass board G are arranged in different areas, respectively. In the vacuum system treatment area 50, treatment parts applying treatment of vacuum system to the glass board G are installed in each treatment and each layer along a carrying path 10 and arranged being divided in each lair.
申请公布号 JP2000156395(A) 申请公布日期 2000.06.06
申请号 JP19980346643 申请日期 1998.11.20
申请人 TOKYO ELECTRON LTD 发明人 TATEYAMA KIYOHISA;NOMURA MASAFUMI;OTA YOSHIHARU;ARAKI SHINICHIRO;YAMAKI IKUO;ORIMO FUMIO
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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