发明名称 |
Charged-particle-beam exposure device and method capable of high-speed data reading |
摘要 |
A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.
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申请公布号 |
US6072185(A) |
申请公布日期 |
2000.06.06 |
申请号 |
US19970971917 |
申请日期 |
1997.11.18 |
申请人 |
FUJITSU LIMITED |
发明人 |
ARAI, SOICHIRO;MIYAZAWA, KENICHI;YABARA, HIDEFUMI;YASUDA, HIROSHI |
分类号 |
G03F7/20;G06F5/00;H01J37/302;H01J37/317;H01L21/027;(IPC1-7):H01J37/304 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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