发明名称 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
摘要 A pattern transfer system includes a stage device. The system includes a fine-motion driving device for moving a movable stage through a first range, a relatively rough-motion driving device for moving the movable stage through a second range, which has substantially the same extent as the first range, and a transfer device for transferring a pattern onto a substrate placed on the movable stage.
申请公布号 US6072183(A) 申请公布日期 2000.06.06
申请号 US19940263406 申请日期 1994.06.21
申请人 CANON KABUSHIKI KAISHA 发明人 ITOH, HIROHITO;OHISHI, SHINJI
分类号 B23Q1/00;B23Q1/30;B23Q1/62;B23Q5/28;B23Q11/00;G03F7/20;G03F9/00;H01J37/20;H01L21/027;H01L21/68;(IPC1-7):H01J37/20 主分类号 B23Q1/00
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