发明名称 |
Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
摘要 |
A pattern transfer system includes a stage device. The system includes a fine-motion driving device for moving a movable stage through a first range, a relatively rough-motion driving device for moving the movable stage through a second range, which has substantially the same extent as the first range, and a transfer device for transferring a pattern onto a substrate placed on the movable stage.
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申请公布号 |
US6072183(A) |
申请公布日期 |
2000.06.06 |
申请号 |
US19940263406 |
申请日期 |
1994.06.21 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
ITOH, HIROHITO;OHISHI, SHINJI |
分类号 |
B23Q1/00;B23Q1/30;B23Q1/62;B23Q5/28;B23Q11/00;G03F7/20;G03F9/00;H01J37/20;H01L21/027;H01L21/68;(IPC1-7):H01J37/20 |
主分类号 |
B23Q1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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