发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE IMAGE FORMING MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To provide the photopolymerizable composition high in sensitivity and adapted to a material for forming various patterns for a litho-graphic printing plate, a printed board, a color filter, or the like. SOLUTION: The photopolymerizable composition comprises an additionally polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system containing at least one radical activator. In this case, the photopolymerization initiator system contains compounds selected from >=2 groups of the following 3 groups; (a) an amino acid or its condensate or its bipolar ion compound, (b) an amino acid salt or its condensate, (c) an amino acid ester or its condensate.</p>
申请公布号 JP2000155414(A) 申请公布日期 2000.06.06
申请号 JP19980329004 申请日期 1998.11.19
申请人 MITSUBISHI CHEMICALS CORP 发明人 NAGAO TAKUMI;URANO TOSHIYOSHI;HINO ETSUKO
分类号 G03F7/004;C08F2/48;G02B5/20;G03F7/027;G03F7/029;G03F7/031 主分类号 G03F7/004
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