发明名称 Flexible skin incorporating mems technology
摘要 A flexible skin formed of silicon islands encapsulated in a polyimide film. The silicon islands preferably include a MEMS device and are connected together by a polyimide film (preferably about 1-100 mu m thick). To create the silicon islands, silicon wafers are etched to a desirable thickness (preferably about 10-500 mu m) by Si wet etching and then patterned from the back side by reactive ion etching (RIE).
申请公布号 US6071819(A) 申请公布日期 2000.06.06
申请号 US19980012756 申请日期 1998.01.23
申请人 CALIFORNIA INSTITUTE OF TECHNOLOGY 发明人 TAI, YU-CHONG;JIANG, FUKANG;HO, CHIHMING
分类号 B81B3/00;B81B7/00;B81C1/00;H01L21/301;(IPC1-7):H01L21/311 主分类号 B81B3/00
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