INJECTOR FOR HIGH ENERGY ION FOR PRODUCING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An ion injector for producing a semiconductor device is provided to prevent the leakage of an arc chamber by preventing the curvature of a filament and by maintaining the balance of the filament. CONSTITUTION: An arc chamber(31) is installed in an ion injector(30) of high energy for supplying process gas to inside. A supporting block(32) is installed in the lower part of the arc chamber for supporting the arc chamber, and a filament is installed in one side of the arc chamber for feeding a uniform voltage to ionize the process gas by emitting thermal electron to the process gas supplied to the inside of the arc chamber. And a supporting unit(40) of filament is installed in the ion injector for preventing the sag of the filament. Herein, the supporting unit of filament includes a filament clamp(41), a supporter(42) of filament, and a filament spring(43). The filament spring maintains the balance of the filament and prevents the filament from being curved by operating restoring force to the filament.