| 摘要 |
PURPOSE: An acrylate photosensitive resin composition for lithographic plate is provided which shows a rapid developing property regardless of high molecular weight. CONSTITUTION: The composition comprises: (i) 30-40 wt. parts of quaternary copolymeric material having an acrylic monomer with a hetero ring, R, at the end and an acrylic monomer with a hetero ring, R', at the end, wherein R is one of tetrahydrofuran, tetrahydropyran and hetero ring having 5-8 carbons and R' is one of fluoroacetic acid, chloroacetic acid, bromoacetic acid, iodoacetic acid, dichloroacetic acid, trichloroacetic acid and it's similar halogenated acetic acid; (ii) 50-70 wt. parts of ethylcellosolve and methylcellosolve; (iii) 1-2 wt. parts of dye; and (iv) 0.5-1 parts of additive. |
