发明名称 |
ACRYLATE PHOTOSENSITIVE RESIN COMPOSITION FOR LITHOGRAPHIC PLATE |
摘要 |
PURPOSE: An acrylate photosensitive resin composition for lithographic plate is provided which shows an excellent mechanical strength and good degree of resolution and reproductivity and a rapid developing property. CONSTITUTION: The composition comprises: (i) 30-40 wt. parts of tertiary copolymeric material having an acrylic monomer with a hetero ring, R, at the end, wherein R is one of tetrahydrofuran, tetrahydropyran and hetero ring having 5-8 carbons; (ii) 50-70 wt. parts of ethylcellosolve and methylcellosolve; (iii) 1-2 wt. parts of dye; and (iv) 0.5-1 parts of additive. |
申请公布号 |
KR20000030320(A) |
申请公布日期 |
2000.06.05 |
申请号 |
KR20000008613 |
申请日期 |
2000.02.22 |
申请人 |
LEE, HAI WON;D N L |
发明人 |
LEE, HAI WON;YU, JANG KEUN;KIM, KYEONG CHEOL;JEONG, TAEK SEO |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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