发明名称 |
APPARATUS FOR MANUFACTURING SEMICONDUCTOR PROVIDING IMPROVED GAS INJECTION UNIT |
摘要 |
PURPOSE: An apparatus for manufacturing a semiconductor providing an improved gas injection unit is provided to prevent a crack from being generated to the glass tube of a furnace. CONSTITUTION: An apparatus for manufacturing a semiconductor providing an improved gas injection unit includes a furnace(40) comprising a boat(46) able to stack an inner tube(44), an outer tube(42), and loaded between inner tubes a wafer and a gas injection unit(48) for injecting a source gas to form a material film in the boat. The gas injection unit is extended from the low part of the boat to the upper part of the boat to uniformly spray the source gas to the wafer stacked on the boat.
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申请公布号 |
KR20000032267(A) |
申请公布日期 |
2000.06.05 |
申请号 |
KR19980048671 |
申请日期 |
1998.11.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEONG, KYOUNG SOO |
分类号 |
H01L21/20;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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