发明名称 |
ARC CHAMBER OF EQUIPMENT FOR INJECTING ION |
摘要 |
PURPOSE: An arc chamber of an equipment for injecting ion is provided to increase tightness of a filament and the arc chamber and to prevent damage. CONSTITUTION: A supplying pipe(12) of gas and an extracting aperture(14) are formed in an arc chamber(40) forming an ion source(200). Guides(44) are inserted to one side of the ion source through two holes formed in the arc chamber, and an insulator(42) is installed between the guide and the arc chamber. The outer circumference of the guide is formed as a bolt type having screw thread for being inserted to the insulator. The both ends of a filament(20) are connected to electric power lines(16,18), and a reflector(30) is inserted to the insulator on the surface facing the filament for being insulated from the arc chamber. When electric power is supplied to the filament and the gas is supplied, an ion is generated by the thermal electron generated from the filament. Then, the ionized cation is extracted to ion beam by using an extractor.
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申请公布号 |
KR20000031240(A) |
申请公布日期 |
2000.06.05 |
申请号 |
KR19980047181 |
申请日期 |
1998.11.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SEONG JU;LEE, SEOK JUN;GWON, YEONG SU;JEONG, YEONG DONG |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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