EQUIPMENT FOR INJECTING ION OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: An equipment for injecting ion for a semiconductor device is provided to easily handle a scanning Faraday assemble while attaching and detaching and to prevent an accident by using light weighted scanning Faraday assemble. CONSTITUTION: An equipment for injecting ion includes a chamber(10) for injecting ion beam to a wafer, a head(20) installed in the chamber for loading and unloading the wafer, a scanner installed in the chamber for scanning the ion beam irradiated to the wafer, a lead screw apparatus(30) installed on the exterior of the chamber for linearly reciprocating the scanner, and a scanning Faraday assemble(40) surrounding the lead screw apparatus for protecting the lead screw apparatus while being produced by plastic material. Therefore, the ion beam is inputted to the chamber to the wafer settled in the head for operating a diffusing process.