DEVICE FOR LOCKING LOAD WITH IMPROVED LOCATION OF HIGH VACUUM VALVE

摘要

PURPOSE: A device for locking load is provided improve the purity of the device and to prevent a wafer from being contaminated by installing a high vacuum valve in the lower part in the exterior of a vacuum chamber for absorbing contaminating source remained on the floor of the vacuum chamber. CONSTITUTION: A treating apparatus and a device for locking load are installed. And, a high vacuum valve is installed under a vacuum chamber for making the inside of the device for locking load vacuum. Therefore, contaminating source generated from the high vacuum valve is prevented from remaining in the vacuum chamber and is absorbed easily for improving purity of the vacuum chamber by installing the high vacuum valve out of the vacuum chamber.