METHOD FOR CLEANING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for cleaning a semiconductor device is provided to effectively remove a remained organic matter to improve reliability of a device. CONSTITUTION: A method for cleaning a semiconductor device includes steps of spray ingnitrogen gases of a low temperature to a wafer(23), which is loaded on a susceptor(22), using a gas spray nozzle(25) in a chamber(21) to cool the wafer and generating a plasma using the sprayed nitrogen gases and sputtering.