SYSTEM FOR EXPOSING OF SEMICONDUCTOR

摘要

PURPOSE: A system for exposing of a semiconductor is provided to provide an exposure system which is not effected to a distance variation between a silicon wafer and a projection lens. CONSTITUTION: A light required to an exposure is radiated through a laser ejector(20). The radiated laser diverges and focuses via a lens group(22) and is transformed into a light having a locally uniform intensity of radiation. A path of such transformed laser is transformed by mirrors(24,26) located one or more and passes a compound eyes lens(28) and divides into light beams having same intensity of light. The divided light beams are again focused via a focusing lens(30) and, simultaneously, radiated to a mask(32) to be projected via the projection lens after a predetermined pattern is projected. The laser projected to the projection lens is transformed into an each other parallel laser via a correcting lens(38) to be radiated on the surface of a silicon wafer(36).