METHOD OF FORMING CONDUCTIVE PATTERN

摘要

A method of forming a conductive pattern, comprising the steps of: (1) depositing a resin layer and an energy-sensitive layer on a substrate in that order, (2) emitting active energy radiation or heat radiation to the energy-sensitive layer directly or through a mask for a desired pattern, (3) developing the energy-sensitive layer to form a resist pattern layer of the energy-sensitive layer, and (4) removing the exposed resin layer by developing it. The method may comprise the steps (1) and (2), and the step (3') of removing the energy-sensitive layer and the resin layer at the same time by development.