| 摘要 |
<p>An etching solution which exhibits etching rates for both of a thermally oxidized film (THOX) and a boron-phosphorus-glass film (BPSG) of 100Å/min or less at 25 °C, and an etching rate ratio : etching rate for BPSG / etching rate for a thermally oxidized film (THOX) of 1.5 or less.</p> |
