发明名称 Method of manufacturing optical waveguide having no void
摘要 <p>In a method of manufacturing an optical waveguide, a lower clad layer (6) is formed, by using CVD, on a substrate 1. The lower clad layer is made of a quartz material. A core formation layer (7) is formed, by CVD, on the lower clad layer. The core formation layer is made of a quartz material. At least two cores (8) are formed as channels by patterning the core formation layer. An upper clad layer (9) is formed, by CVD in which one or more organic materials are used as a source/sources, on the cores and the lower clad layer. The upper clad layer is made of a quartz material which includes at least one of phosphors, boron, and germanium as a dopant. The sources include an identical alkoxyl radical. <IMAGE></p>
申请公布号 EP0803589(B1) 申请公布日期 2000.05.31
申请号 EP19960117978 申请日期 1996.11.08
申请人 NEC CORPORATION 发明人 NISHIMOTO, HIROSHI
分类号 C03B19/14;C03C17/00;C23C16/40;G02B6/12;G02B6/125;G02B6/13;G02B6/132;(IPC1-7):C23C16/40;G02B6/00 主分类号 C03B19/14
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