发明名称 |
Insulated gate type semiconductor device with potential detection gate for overvoltage protection |
摘要 |
Internal gate electrodes (71) are all connected in common to a gate terminal, and a floating gate electrode (72) is connected to the gate electrode of an NMOS transistor (M1). An external emitter electrode (91) is provided on a first major surface of P-type diffused lease region (21), and N-type diffused emitter region (31) and P-type diffused base region (21) are short-circuited. The source of the NMOS transistor (M1) and an emitter terminal are also connected to the external emitter electrode (91). The drain of the NMOS transistor (M1) is connected to an external terminal.
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申请公布号 |
US6069372(A) |
申请公布日期 |
2000.05.30 |
申请号 |
US19980116342 |
申请日期 |
1998.07.16 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
UENISHI, AKIO |
分类号 |
H01L29/739;(IPC1-7):H01L29/74 |
主分类号 |
H01L29/739 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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