发明名称 SUBSTRATE PLACEMENT DEVICE AND VACUUM PROCESS DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate placement device with less dust and high thermal conductivity. SOLUTION: Related to a substrate placement device 11 provided on a bottom wall side of a vacuum vessel 1, an elastic member 18 is fitted inside the recessed part on the surface of a dielectric body 12. The surface of elastic member 18 is higher than the surface of dielectric body 12, and when, with a substrate 7 placed on the elastic member 18, the electrodes 13 and 14 provided inside the dielectric body 12 are applied with a voltage, an electrostatic attraction force is applied to the substrate so that the elastic member 18 so compressed that the rear surface of the substrate 7 contacts the surface of the dielectric body 12. Since the contact area to the elastic member 18 is large even when the substrate 7 is thermal-expanded, less dust is caused. Further, since the rear surface of the substrate 7 is forced to tightly contact the surface of the elastic member 18 under the restoring force of the elastic member 18, a thermal conductivity is high.</p>
申请公布号 JP2000150628(A) 申请公布日期 2000.05.30
申请号 JP19980317031 申请日期 1998.11.09
申请人 ULVAC JAPAN LTD 发明人 FUWA KO;MAEHIRA KEN
分类号 H01L21/683;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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