发明名称 PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a processing system wherein an object to be processed is smoothly delivered between an air system region and a vacuum system region. SOLUTION: Between a transportation channel 10 side and process chambers side, load lock chambers 201a-201d are provided in multi stages. Related to the load lock chambers 201a-201d, the inside of it is an air atmosphere for delivery of a glass substrate G, which is changed to a vacuum atmosphere for transporting the glass substrate G to the process chamber side.
申请公布号 JP2000150395(A) 申请公布日期 2000.05.30
申请号 JP19980336464 申请日期 1998.11.12
申请人 TOKYO ELECTRON LTD 发明人 TATEYAMA KIYOHISA;ARAKI SHINICHIRO
分类号 H01L21/302;B65G49/07;C23C16/44;H01L21/02;H01L21/027;H01L21/205;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/205;H01L21/306 主分类号 H01L21/302
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