发明名称 LASER ANNEALING FURNACE
摘要 PROBLEM TO BE SOLVED: To provide a laser annealing furnace which is designed to prevent contamination on objects so to be treated, to shorten the treating time, to improve the quality of laser annealing, and to reduce the manufacturing cost. SOLUTION: A laser annealing furnace 3 is provided with a cassette station 32 which is arranged along a conveyance path A, an annealing chamber 37 in which a glass substrate is annealed with a laser beam and which is faced oppositely to the station 32, and a spin cleaning unit 36 which is provided adjacently to the chamber 37 and station 32. A transfer robot 35 provided between the station 32 and chamber 37 transfers the glass substrate received from the station 35 to the unit 36 and, after the substrate is cleaned, directly transfer the substrate to the chamber 37 from the unit 36.
申请公布号 JP2000150411(A) 申请公布日期 2000.05.30
申请号 JP19990338515 申请日期 1999.11.29
申请人 TOSHIBA CORP 发明人 SUZUKI NAOKI;HIRATA NORIYUKI;SHIMIZU MASATOSHI;HIGASHIJIMA TAKUO;TAKAHASHI HIROAKI;KOMATSUBARA YOSHIAKI
分类号 H01L21/268;G02F1/13;H01L21/00;H01L21/304;H01L21/336;H01L21/677;H01L21/68;H01L21/687;H01L29/786;(IPC1-7):H01L21/268 主分类号 H01L21/268
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