| 摘要 |
PROBLEM TO BE SOLVED: To prevent deflection or transfer from occurring by transferring a substrate to be processed to a heating stage by a first transfer means, and delivering the substrate processed with remaining-heat to the first transfer means by a second transfer means. SOLUTION: A substrate 62 with a resist liquid coated which is received from a main arm mechanism 24 is firstly held by a transfer pin 73 of relatively low temperature for process at remaining heat. In this process with remaining heat, most of sublimates (such as solvent) are sublimated from a resist liquid. When the temperature difference between the substrate 62 and a transfer pin 71 almost disappears, the substrate 62 is delivered to the transfer pin 71 from the transfer pin 73, and then transferred to a hot plate 60 by the transfer pin 71, for regular heating. Thus, a fluctuation in a resist film pressure caused by the temperature change of the transfer pin 71 and the substrate 62 is prevented, with occurrence of a transfer trace prevented. Related to the substrate 62, sublimation of solvent, etc., is sufficiently performed from the resist liquid under a remaining heat, so the fluctuation of the resist film pressure or deflection of the substrate is prevented. |
