| 摘要 |
PROBLEM TO BE SOLVED: To raise the throughput by performing the exposure and the detection of alignment information in parallel for two sheets of substrates to be exposed. SOLUTION: An optical system PL and first and second alignment optical systems AA1a, AA1b, AA2a, and AA2b are arranged so that the detection of the alignment information on the other substrate W2 (W1) can be performed in parallel when exposing a mask pattern on one substrate W1 (W2) out of substrates retained side by side on a substrate stage ST. The positioning at the time of exposing the mask pattern on the substrate is performed using the alignment information obtained during exposure. Moreover, means 11 and 12 for detecting the positions of the substrate stage ST used for positioning in exposure position, and means 11 and 13 (11 and 14) for detecting the position of the substrate stage ST used for detection of alignment information in alignment position are arranged severally so that the Abbe error may be zero to the exposure position and the alignment position. |
