| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device wherein sticking of a contamination material to a substrate is suppressed. SOLUTION: A substrate W is lifted/lowered between the upper and inside of a water-washing vessel WB1 by a lifting/lowering mechanism 40. The inside of the water-washing vessel WB1 is continuously supplied with a pure water from a discharge nozzle 20. A protruding/recessed pattern 30 is formed at an upper end part of the water-washing vessel WB1. A protruding/recessed pattern 30 is so formed that recessed parts 31 are provided at least on both sides of the position where a flat plane comprising a main surface of a plurality of substrate W held by the lifting/lowering mechanism 40 crosses the upper end part of the water-washing vessel WB1. The protruding/recessed pattern 30 allows the pure water at the part positioned on both sides of the main surfaces of the plurality of substrates W to flow out of the vessel with priority. As a result, the contamination material floating between substrates W is efficiently discharged out of the vessel, suppressing the contamination material from sticking to the substrate W.
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