| 摘要 |
PROBLEM TO BE SOLVED: To contrive the rise of accuracy in drawing together with the rise of throughput, by enabling the deterioration of beam resolution accompanying the increase of a deflection area, the occurrence of pattern distortion, etc., to be removed. SOLUTION: This is an electron beam drawer which is equipped with a capacitor lens 102 for adjusting the electron beam emitted from an electron gun into desired size and brightness, an objective lens for focusing the electron beam on a sample face 107, a blanking deflector 103 for blanking the electron beam, a blanking aperture 104, and an objective deflector 106 for controlling the position of the electron beam on the sample face 107. In this case, this is provided with an objective driving mechanism 114 which makes the objective lens 105 and the objective deflector 106 mechanically movable within the plane orthogonal to the optical axis of the electron beam, and besides is provided with a deflector 110 for shifting of the optical axis which deflects the electron beam synchronously with this lens 105 and the deflector 106, on the side of the electron gun more than the objective lens 105 and the objective lens 106.
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