发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device wherein the time required for inputting/outputting of a substrate is shortened while operativity at maintenance is improved. SOLUTION: Process regions A and B extending almost in parallel with a transportation region C in between are provided with a plurality of process units 200 while partition covers 100a and 100b are provided between the process regions A and B and the transportation region C. A hand 62 of a substrate transportation unit 60 provided in the transportation region C holes a substrate W while movable in X-axis, Z-axis, andθ-axis directions. The process unit 200 at the center part of the process regions A and B comprises a substrate input/output opening 210 at a front surface while the process units 200 on both sides comprise the substrate input/output opening 210 at a corner part facing the substrate transportation unit 60. A shutter 215 is provided at the substrate input/output opening 210 for free opening/closing. Related to the partition covers 100a and 100b, an opening part 120 is provided at a position facing the substrate opening 210.
申请公布号 JP2000150449(A) 申请公布日期 2000.05.30
申请号 JP19980325105 申请日期 1998.11.16
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 IKEDA MASAHIDE;INAGAKI YUKIHIKO
分类号 H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/027
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