发明名称 Precursor solution for forming thin film of ferroelectric substance and production process thereof
摘要 To form a thin film of ferroelectric substance by sol-gel method, there is provided a process for obtaining a precursor solution from which a coating solution enabling to form a thin film having a film thickness enough to exhibit its property can be obtained just by one coating operation without any multi-coating. After composing a Ti alkoxide oligomer having a cyclic structure or a ladder structure by hydrolysis and poly-condensation of a Ti alkoxide and composing a Zr alkoxide oligomer by hydrolysis and polycondensation of a Zr alkoxide, the Ti alkoxide oligomer is preliminarily hydrolyzed and reacted with the Zr alkoxide oligomer, whereby a Ti-O-Zr precursor is obtained, and a Pb(Ti-O-Zr) is obtained by reacting the Ti-O-Zr precursor with the Pb alkoxide.
申请公布号 US6068690(A) 申请公布日期 2000.05.30
申请号 US19990280991 申请日期 1999.03.30
申请人 KRI INTERNATIONAL, INC. 发明人 AIZAWA, MAMORU
分类号 C04B35/49;C04B35/491;C07F7/24;C07F7/28;C08G79/14;C09D185/00;C09K3/00;C23C18/12;G11B5/62;H01B3/00;H01B3/12;H01L21/02;(IPC1-7):C04B35/491 主分类号 C04B35/49
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