| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a backside electrode simply in a short time and at low cost by continuously forming a metal oxide layer and a high-reflective metal oxide layer by a sputtering method in mixed atmosphere of inert gas and oxygen gas in the same reaction chamber. SOLUTION: A sample 12 wherein a transparent electrode and a photoelectric conversion layer are formed on a glass substrate is mounted from a preparation chamber 18 onto an electrode 15 in a reaction chamber 11, and transferred in the reaction chamber 11. When direct voltage is applied to electrodes 16 and 17, respectively, by DC power supplies 20 and 21, high energy ions of sputtering gas introduced through gas supply pipes 22 and 23 are injected to a Ti target 18 and an Ag target 19. Thereby, titanium oxide and silver oxide adhering to the sample 12 in this order, a backside electrode consisting of a metal oxide layer and a high-reflective metal oxide layer is formed. Thereby material cost is reduced for reduced manufacturing cost.</p> |
