| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron optical system accomplishing a high resolution in a low acceleration area and providing high detection sensitivity for a secondary electron. SOLUTION: This microscopic method uses a charged particle source 1 and a charged particle beam application device carrying a sample inside. In the charged particle beam application device, a first charged particle beam 2 emitted from the charged particle source 1 is focussed by an objective lens 5 so as to irradiate the sample, a second charged particle 8 accelerated in a decelerating electric field, in which the first charged particle beam 2 is decelerated while the second charged particle generated from the sample is accelerated, is deflected by a deflector 10, and the second charged particle deflected by the deflector 10 is detected by a detector 9 arranged on the charged particle source side beyond the objective lens 5 for providing an image signal. In this way, the secondary charged particle can be deflected toward the detector without increasing a charged particle beam diameter even in a low acceleration area, so that a high resolution image can be provided by highly efficient detection.
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