Mechanically stabilized retaining ring for chemical mechanical polishing

摘要

A carrier assembly for chemical mechanical polishing (CMP) includes a retaining ring removably attached to a rigid backing plate. The backing plate provides mechanical support over the entire load bearing surface of the retaining ring. In a further aspect of the present invention, a flexure clamp ring independent of the retaining ring for removably attaching the backing plate to the carrier assembly base Is included as part of the carrier assembly.