发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURE OF IT |
摘要 |
PROBLEM TO BE SOLVED: To promote minuteness of non volatile memory cell. SOLUTION: A floating gate electrode 9 constituting a memory cell M comprising one transistor type cell is provided with a simple cross-section shape I of a single electrode material, and in order to increase the capacity with a control gate electrode 11, the control gate electrode 11 is provided with such cross-section shape II as to cover the side surface of the floating gate electrode 9.
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申请公布号 |
JP2000150833(A) |
申请公布日期 |
2000.05.30 |
申请号 |
JP19980320308 |
申请日期 |
1998.11.11 |
申请人 |
HITACHI LTD |
发明人 |
KATO MASATAKA;OKUYAMA KOSUKE |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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