发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURE OF IT
摘要 PROBLEM TO BE SOLVED: To promote minuteness of non volatile memory cell. SOLUTION: A floating gate electrode 9 constituting a memory cell M comprising one transistor type cell is provided with a simple cross-section shape I of a single electrode material, and in order to increase the capacity with a control gate electrode 11, the control gate electrode 11 is provided with such cross-section shape II as to cover the side surface of the floating gate electrode 9.
申请公布号 JP2000150833(A) 申请公布日期 2000.05.30
申请号 JP19980320308 申请日期 1998.11.11
申请人 HITACHI LTD 发明人 KATO MASATAKA;OKUYAMA KOSUKE
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 主分类号 H01L21/8247
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