| 摘要 |
PROBLEM TO BE SOLVED: To allow an atmosphere gas to uniformly flow from upper to lower parts inside a reaction tube without generating convection in up and down directions, and to prevent a wafer from being contaminated when the wafer is heat-treated. SOLUTION: In the heat treatment oven where the supply and exhaust vents of an atmosphere gas are provided at the upper and lower parts respectively, of a reaction tube being heated by a heat source, a wafer to be heated is placed on a boat 8 for loading into the reaction tube, and heat treatment is made, the shape of the exhaust vent provided at the lower part of the reaction tube is in a long slit extended in a circumference direction, a back chamber 5 is provided at the outside, and one exhaust vent 6 with a larger opening area than the total area of the above slit opening part is provided in the back chamber 5. In this case, the slit-shaped exhaust vent of the reaction tube may be installed at two places or more in the circumference direction at even intervals.
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