| 摘要 |
The preferred embodiment of the present invention overcomes the limitations of the prior art and provides a device and method to increase the robustness of electrostatic discharge (ESD) protection devices by reducing the temperature gradient caused by ESD pulses and reducing the likelihood of thermal runaway caused by large ESD pulses. The preferred embodiment forms implants under the trench isolation structures in the ESD devices. The implants reduce the current-caused heating that can lead to thermal runaway, and thus improve the robustness of the ESD protection device. In the preferred embodiment, the implants are formed using hybrid resist. The hybrid resist provides a method to form that implants that does not require additional masking steps or other excessive processing. Additionally, the hybrid resist provides implants that are self aligned with the well regions. |
