发明名称 |
MISTED PRECURSOR DEPOSITION APPARATUS AND METHOD WITH IMPROVED MIST AND MIST FLOW |
摘要 |
A substrate is located within a deposition chamber, the substrate defining a substrate plane. A barrier plate is disposed in spaced relation above the substrate and substantially parallel thereto, the area of said barrier plate in a plane parallel to said substrate being substantially equal to said area of said substrate in said substrate plane, i.e. within 10% of said substrate area. The barrier plate has a smoothness tolerance of 5% of the average distance between said barrier plate and said substrate. A mist is generated, allowed to settle in a buffer chamber, filtered through a 1 micron filter, and flowed into the deposition chamber between the substrate and barrier plate to deposit a liquid layer on the substrate. The liquid is dried to form a thin film of solid material on the substrate, which is then incorporated into an electrical component of an integrated circuit. |
申请公布号 |
EP0885315(B1) |
申请公布日期 |
2000.05.31 |
申请号 |
EP19970914860 |
申请日期 |
1997.03.04 |
申请人 |
SYMETRIX CORPORATION;MATSUSHITA ELECTRONICS CORPORATION |
发明人 |
HAYASHI, SHINICHIRO;MCMILLAN, LARRY, D.;AZUMA, MASAMICHI;PAZ DE ARAUJO, CARLOS, A. |
分类号 |
B05D1/00;B05D3/04;B05D3/06;B05D7/24;C23C8/10;C23C16/44;C23C16/448;C23C16/455;C23C16/46;C23C16/48;C23C16/52;C23C18/12;C23C18/14;C23C26/02;C30B7/00;H01L21/02;H01L21/31;H01L21/314;H01L21/316;H01L27/115;H01L39/24;H01L41/24;H05K3/10 |
主分类号 |
B05D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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