| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of precipitates after wet etching. SOLUTION: This equipment is provided with an etching chamber 4 having a shower nozzle 4N for feeding the surface of a glass substrate 1 with an etching solution 4S for a chromium or chromium-alloy film formed on the surface of the glass substrate 1, a first cleaning chamber 5 having a shower nozzle 5N for feeding the surface of the glass substrate 1 with a first cleaning solution 5S composed of an acidic aqueous solution of hydrochloric acid of pH 0-1.3, a second cleaning chamber 6 having a shower nozzle 6N for feeding the surface of the glass substrate 1 with a second cleaning solution 6S composed of pure water, and a drying chamber 7.
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