| 摘要 |
PROBLEM TO BE SOLVED: To provide a preparation process of a hydrogen silsesquioxane resin which does not generate non-recyclable aryl sulfonic acid or the like, even when aryl sulfonic acid or the like is used. SOLUTION: To a two-phase system comprising a water phase containing sulfuric acid and an organic sulfonic acid which is not sulfonated by sulfuric acid and is soluble to both water and the after-mentioned organic phase and an organic phase comprising a halogenated hydrocarbon solvent which dissolves the organic sulfonic acid and does not react with sulfuric acid, a solution of trichlorosilane (HSiCl3) in a halogenated hydrocarbon solvent is added and stirred to prepare a hydrogen silsesquioxane resin. Here, the ratio of sulfuric acid in the total amount of water (including the water of hydration when a surfactant contains this) and sulfuric acid is from 80 to 96 wt.%, and the concentration of a surfactant in the organic phase is 0.008 mol/L or larger.
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