发明名称 NEGATIVE RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To enable a chemically amplifying negative resist compsn. containing an alkali soluble resin, radiation-sensitive acid producing agent and crosslinking agent crosslinkable with an acid to satisfy characteristics of sensitivity, resolution and resist profile when electron beams or X-rays are used by satisfying at least one condition of specified conditions. SOLUTION: In the chemically amplifying negative resist compsn. containing an alkali-soluble resin, radiation-sensitive acid producing agent and crosslinking agent with crosslinks with an acid, at least one condition in the following conditions is satisfied. The conditions are that (1) the radiation-sensitive acid producing agent is a compd. expressed by formulae I, II or the like, and that (2) the crosslinking agent is a low mol.wt. phenolic deriv. having <=1000 mol.wt. and a specified structure. In the formulae I and II, each of R1 to R27 may be same or different and represents a hydrogen atom, straight-chain, branched or cyclic alkyl group, straight-chain, branched or cyclic alkoxy group, hydroxy group, halogen atom or the like and X is at least one fluorine atom or the like.
申请公布号 JP2000147752(A) 申请公布日期 2000.05.26
申请号 JP19980314816 申请日期 1998.11.05
申请人 FUJI PHOTO FILM CO LTD 发明人 UENISHI KAZUYA;KODAMA KUNIHIKO;KUNIDA KAZUTO
分类号 C07D251/24;G03F7/004;G03F7/038;G03F7/039;H01L21/027 主分类号 C07D251/24
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