发明名称 EXPOSURE DEVICE, AND IMAGE FORMING DEVICE INCLUDING THE SAME
摘要 PROBLEM TO BE SOLVED: To reduce cost required for adjusting plural optical elements in an exposure device in an image forming device using the exposure device which performs exposure by using two or more light beams all together. SOLUTION: In this exposure device, lenses 44 ((a) to (d)), galvano mirrors 46 ((a) to (d)), half mirrors 42p, 42q and 42r and a cylindrical lens 42s which are positioned nearer to a semiconductor laser elements 41 ((a) to (d)) side than a deflecting device 43 are integrally held by a base 33. Thus, plural stages required in the case of respectively assembling the optical element positioned nearer to a photoreceptor drum side than the deflecting device and the optical element set on the base are separated. Since a housing 21a and the base are formed of material having equal linear expansion coefficient, focus is prevented from being deviated even when distortion occurs because of temperature change, etc.
申请公布号 JP2000147399(A) 申请公布日期 2000.05.26
申请号 JP19980323873 申请日期 1998.11.13
申请人 TOSHIBA CORP 发明人 KAIHO SATOSHI
分类号 H04N1/113;B41J2/44;G02B26/10;(IPC1-7):G02B26/10 主分类号 H04N1/113
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