| 摘要 |
PROBLEM TO BE SOLVED: To make accurately analyzable in a short time by multiply layering on a substrate using ruthenium on a reflection layer and beryllium on a spacer layer and constituting with a specific periodic length and a layer number. SOLUTION: A layer body consisting of a reflection layer 31 and a spacer layer 32 is multiply layering in constitution on a substrate 7 such as silicon wafer. For the reflection layer 31, ruthenium is used, for the spacer layer 32, beryllium is used and a film is made by ion beam sputtering method, for example. The periodic length (d) is desired to be 7 to 10 nm from a theoretical calculation and experience for gaining a constant reflection intensity and reducing the background. The layer number is obtained from the theoretical calculation corresponding to the periodic length (d) and desired to be 20 to 40. However, the periodic length (d) and the layer number is desired to be selected and used according to the purpose and usage. For example, when the periodic length (d) is 7 nm, 10 nm and 15 nm, the layer number corresponding to the periodic numbers (d) to be 30 to 50 layers, 25 to 40 layers and 20 to 40 layers are used.
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