发明名称 INSPECTION INSTRUMENT FOR SURFACE DEFECT
摘要 PROBLEM TO BE SOLVED: To obtain a surface defect which does not judge a harmless linear enevenness as a harmful defect. SOLUTION: This apparatus is so constituted as a surface defect inspection apparatus for band substances 1 that the kind and degree of a surface defect 2 of a band substance 1 may be judged by image-analyzing reflected light of light projected on the surface of the band substance 1. In this case, it is provided with a storing means 14 which temporarily stores the kinds and degrees and the band substance's cross- direction generation positions of all the primarily-judged defects 2, only in a section of a constant length of the band substance 1, whose kinds and degrees have been judged primarily on the basis of picture images processed at each specified length and each specified breadth unit of the band substance 1, a defect generation frequency distribution forming means 15, which forms band substance's cross-direction frequency distribution of defects 2 in a section of a constant length of the band substance 1 stored in the storing means 14, on the basis of reference kinds of defects and degrees of defects set beforehand, and a linear unevenness discriminating means 17 which discriminates harmless linear unevenness existing in defects primarily-judged as harmful, on the basis of the defect generation frequency distribution formed by the defect generation frequency distribution forming means 15.
申请公布号 JP2000146555(A) 申请公布日期 2000.05.26
申请号 JP19980328245 申请日期 1998.11.18
申请人 NKK CORP 发明人 MATSUFUJI YASUHIRO;SUYAMA TSUNEO;NAKAGAWA KATAYUKI
分类号 G01B11/30;G01N21/89;G01N21/892;(IPC1-7):G01B11/30 主分类号 G01B11/30
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