| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a high hardness film tight in adhesion on the surface of the object to be coated at a high speed. SOLUTION: A 1st gaseous starting material contg. carbon and a 2nd gaseous starting material contg. silicon are introduced into a vacuum vessel stored with the object to be coated, accelerated electron beams from an electron beam gun 1 are applied, and ionization and dissociation are executed to generate electron beam excited plasma of the 1st and 2nd gaseous starting materials, and, moreover, negative bias voltage is applied to the object to be coated to form a silicon-contg. diamondlike carbon(DLC) film on the surface of the object to be coated.
|
