FORMATION OF FLAT FACE ON ATOMIC SCALE IN SURFACE OF METALLIC SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a flat face on an atomic scale in the surface of a metallic substrate by an electrochemical method capable of flattening on an electronic level having a practically requred width. SOLUTION: This is a method for forming a flat face on an atomic scale in the surface of a metallic substrate, and (a) a stage in which a metallic substrate is set to the inside of an ionic soln., (b) a stage in which the potential of the metallic substrate is repeatedly sweeped between that equal to or above the oxidation porential and that equal to or below the reduction potential at a certain potential operating rate for prescribed times, (c) a stage in which it is treated for a presribed time at the potential equal to or below the oxidation potential and close to the oxidation potential and (d) a stage in which the (b) and (c) stages are repeatedly executed for plural times are performed.