发明名称 NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND INSULATING FILM
摘要 <p>PROBLEM TO BE SOLVED: To provide a negative photosensitive polyimide composition. SOLUTION: The negative photosensitive polyimide composition is soluble in solvents and it comprises >=2 units of aromatic diamines in the main chain of polyimide and one of them is the photosensitive aromatic diamine and the other one is the aromatic diamine having a hydrophilic group, and the above photosensitive aromatic diamine has acrylate or methacrylate ester groups as photosensitive groups in the side chains, and this invention includes the image forming method.</p>
申请公布号 JP2000147768(A) 申请公布日期 2000.05.26
申请号 JP19980353761 申请日期 1998.11.07
申请人 PI GIJUTSU KENKYUSHO:KK 发明人 NAKANO TSUNETOMO;ITAYA HIROSHI;MATSUMOTO SHUNICHI
分类号 H05K3/06;C08G73/12;C08L79/08;C09D5/00;C09D179/08;G03F7/027;G03F7/038;H01L21/027 主分类号 H05K3/06
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