发明名称 |
NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND INSULATING FILM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a negative photosensitive polyimide composition. SOLUTION: The negative photosensitive polyimide composition is soluble in solvents and it comprises >=2 units of aromatic diamines in the main chain of polyimide and one of them is the photosensitive aromatic diamine and the other one is the aromatic diamine having a hydrophilic group, and the above photosensitive aromatic diamine has acrylate or methacrylate ester groups as photosensitive groups in the side chains, and this invention includes the image forming method.</p> |
申请公布号 |
JP2000147768(A) |
申请公布日期 |
2000.05.26 |
申请号 |
JP19980353761 |
申请日期 |
1998.11.07 |
申请人 |
PI GIJUTSU KENKYUSHO:KK |
发明人 |
NAKANO TSUNETOMO;ITAYA HIROSHI;MATSUMOTO SHUNICHI |
分类号 |
H05K3/06;C08G73/12;C08L79/08;C09D5/00;C09D179/08;G03F7/027;G03F7/038;H01L21/027 |
主分类号 |
H05K3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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