| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a free abrasive grain slurry composition capable of uniformly polishing a material which is to be polished and contains a soft material mixed with a hard material different in hard Vickers hardness without a difference in amount polished by dispersing a polycrystalline diamond powder in a dispersion medium. SOLUTION: This free abrasive grain slurry composition is obtained by dispersing a polycrystalline diamond powder having <=1.00 half-width of the peak of the (111) face in diamond according to an X-ray diffractometry and >=200 intensity ratio of the peak of the graphite contained in the polycrystalline diamond powder to the polycrystalline diamond powder according to the X-ray diffractometry and further <=1.00μm average grain diameter in a dispersion medium in the free abrasive grain slurry composition for polishing a material which is to be polished and contains a soft material composed of a metal, or the like, having 26-360 hard Vickers hardness mixed with a hard material composed of ceramics, or the like, having 700-4,000 hard Vickers hardness. The resultant slurry composition is capable of uniformly working a thin-film magnetic head, or the like, at the time of polishing working thereof without causing a difference in amount polished between different kinds of materials.</p> |
