| 摘要 |
PROBLEM TO BE SOLVED: To obtain a compsn. having good dependency on the state of a pattern whether the pattern is dense or sparse and having excellent sensitivity for a light source of short wavelength by incorporating a resin which has specified groups and alkali-soluble groups protected with groups having a specified alicyclic hydrocarbon structure and which is decomposed by the effect of an acid to increase its solubility with alkali. SOLUTION: This positive photoresist compsn. for exposure by far UV rays contains a compd. which produces an acid by irradiation of active rays or radiation and a resin which has specified groups and alkali-soluble groups protected with at least one kind of group expressed b formulae I to III having an alicyclic hydrocarbon structure and which is decomposed by the effect of an acid to increase its solubility with alkali. In formulae I to III, R11 is a methyl group, ethyl group, isobutyl, sec-butyl group or the like, z is a group of atoms necessary to form an alicyclic hydrocarbon group with carbon atoms, each of R12 to R16 is independently 1-4C straight-chain or branched alkyl group or alicyclic hydrocarbon group. |
