POSITIVE ELECTRONIC BEAM AND X-RAY RESIST COMPOSITION

摘要

PURPOSE: A positive electronic beam and X-ray resist composition are provided to improve developing defect by providing a rectangular pattern profile of high quality with high dissolution capability. CONSTITUTION: A positive electronic beam or X-ray resist composition is composed of a compound capable of generating an acid by the illumination of electronic beam or X-ray, a resin having a radical dissolved by the action of an acid and increasing solubility in alkali developing solution, a resin insoluble in water and soluble in alkali developing solution, and a fluoric and/or silicon surface-active agent. The compound capable of generating an acid by the illumination of electronic beam or X-ray is the compound generating a benzene sulfonic acid, a naphthalene sulfonic acid and an antrasen sulfonic acid displaced by at least one radical having at least one fluoric atom and/or at least one fluoric atom.