| 摘要 |
PURPOSE: A negative photoresist composition is provided to improve a sensitivity and a resolution by including a photosensitive polyamide acid. CONSTITUTION: A negative photoresist composition has a polyamide acid, a 1,4-dihydropyridine derivative with a chemical formula 1, and a 1,4-dihydropyridine derivative with a chemical formula 2. The 1,4-dihydropyridine derivative with the chemical formula 1 and the 1,4-dihydropyridine derivative with the chemical formula 2 have a weight ratio with 1: 5 to 5: 1. The negative photoresist composition has the polyamide acid, a 1-carboxyl ethyl-3,5-dimethoxycarbonyl-4-(2-nitrophenyl)-1,4-dihydropyridine with a chemical formula 3, and a 1-ethyl-3,5-dimethoxycarbonyl- 4-(2-nitrophenyl)- 1,4- dihydropyridine with a chemical formula 4. The 1-carboxyl ethyl-3,5- dimethoxycarbonyl- 4-(2-nitrophenyl)-1,4-dihydropyridine with the chemical formula 3 and the 1-ethyl-3,5- dimethoxycarbonyl-4-(2-nitrophenyl)-1,4-dihydropyridine with the chemical formula 4 have a weight ratio with 1: 5 to 5: 1.
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