发明名称 |
IMAGED APERTURE MASK GRATING WRITING |
摘要 |
A method is disclosed of writing a grating in a photosensitive waveguide comprising the steps of: (a) projecting photosensitive light in a first direction through a mask (3) having a series of spaced apart opaque lines; (b) focusing the light after it has passed through the mask down to a focal point (5); and (c) placing the photosensitive waveguide (7, 8) in the region adjacent said focal point to image the mask in the photosensitive waveguide to thereby induce refractive index changes in regions of the photosensitive waveguide exposed to the light to write said grating.
|
申请公布号 |
WO0029884(A1) |
申请公布日期 |
2000.05.25 |
申请号 |
WO1999AU01002 |
申请日期 |
1999.11.12 |
申请人 |
THE UNIVERSITY OF SYDNEY;CANNING, JOHN |
发明人 |
CANNING, JOHN |
分类号 |
G02B5/26;G02B5/28;G02B6/10;(IPC1-7):G02B6/18 |
主分类号 |
G02B5/26 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|