POSITIVE PHOTORESIST COMPOSITION

摘要

PURPOSE: A positive photoresist composition capable of reducing the generation of a sublimate even in the baking of a high temperature and forming the resist pattern, almost near to a rectangle, of high sensitivity and high resolution is provided. CONSTITUTION: A positive photoresist composition suitable for manufacturing the liquid crystal element such as a thin film transistor is formed by containing a beehiortho type cresolnovolak resin acquired by reacting a phenol containing at least p-creosol with an acid catalytic aldehyde, and a quinonediazide group containing composition. The 2 nuclear body content of p-creosol is less than 2.0 percent in GPC method.