HIGH TEMPERATURE TRANSISTOR WITH REDUCED RISK OF ELECTROMIGRATION

摘要

A semiconductor device, in accordance with the present invention, includes a source region and a drain region disposed on opposite sides of a gate structure. A first conductive region is disposed over and is electrically connected to the source region and a second conductive region disposed over and electrically connecting to the drain region, the first and second conductive regions disposed on opposite sides of the gate structure. The first conductive region has a narrow end portion on a first side and gradually widens to a wide end portion on a second side. Also, the second conductive region has a narrow end portion on the second side and gradually widens to a wide end portion on the first side, the gradual widening for increasing cross sectional areas of the conductive regions in accordance with an increase in a magnitude of current flow. The current flow is generated by activation of the gate structure.